Template:Semiconductor manufacturing processes: Difference between revisions

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 * {{0|00}}[[7 nm process|7&nbsp;nm]]&nbsp;– 2018<!--date must match the article. Put refs in article, not here-->
 * {{0|00}}[[5 nm process|5&nbsp;nm]]&nbsp;– 2020<!--date must match the article. Put refs in article, not here-->
+* {{0|00}}[[3 nm process|3&nbsp;nm]]&nbsp;– 2022<!--date must match the article. Put refs in article, not here-->
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 | content3     = <div style="padding-left:14px;">Future
-* {{0|00}}[[3 nm process|3&nbsp;nm]]&nbsp;~ 2023<!--date must match the article. Put refs in article, not here-->
 * {{0|00}}[[2 nm process|2&nbsp;nm]]&nbsp;~ 2024<!--date must match the article. Put refs in article, not here-->
 <!-- Do not add entries unless there is an article to support them. This template is intended as a way to navigate to Wikipedia articles on this subject. See Doc page.-->

Semiconductor device fabrication
File:4-fach-NAND-C10.JPG
MOSFET scaling (process nodes)
010 µm – 1971 006 µm – 1974 003 µm – 1977 1.5 µm – 1981 001 µm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018 005 nm – 2020 003 nm – 2022
Future 002 nm ~ 2024
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
v t e