Template:Semiconductor manufacturing processes: Difference between revisions

From Vigyanwiki

Semiconductor manufacturing processes

Latest revision as of 08:46, 4 June 2023

Important: read the documentation before modifying this template.

Semiconductor device fabrication
File:4-fach-NAND-C10.JPG
MOSFET scaling (process nodes)
010 µm – 1971 006 µm – 1974 003 µm – 1977 1.5 µm – 1981 001 µm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018 005 nm – 2020 003 nm – 2022
Future 002 nm ~ 2024
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
v t e

Lua error in Module:TNT at line 182: Missing Commons dataset I18n/Module:TNT.tab.

Retrieved from ‘https://www.vigyanwiki.in/index.php?title=Template:Semiconductor_manufacturing_processes&oldid=173049’

Hidden categories: